P02800 - SEMI P28 - Specification for Overlay-Metrology Test Patterns for Integrated-Circuit Manufacture StdTpc-Cluster Tools SEMI MF1152-0316 (technical revision)

SEMI MF1152-0316 (technical revision)

SEMI S14-0521 (technical revision)

optical characteristics (single transmittance

but controlled

This Standard is expected to:

P02800 - SEMI P28 - Specification for Overlay-Metrology Test Patterns for Integrated-Circuit Manufacture StdTpc-Cluster Tools SEMI MF1152-0316 (technical revision)This standard was technically approved by the global Micropatterning Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on April 25, 2007. It was available at www. semi. org in June 2007. Originally published in 1996. NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available