BIONIKA DI UF, Tubular abutment, stepped, implant level, non-positioned Sulcus:s 1 mm leaving space for the final

leaving space for the final restorative material (e

This ensures reliable fit and function of the final restoration during clinical application

high-pitch self-cutting thread

highly resistant to mechanical stress and corrosion

where precise adjustment and long-term stability are equally important

BIONIKA DI UF, Tubular abutment, stepped, implant level, non-positioned Sulcus:s 1 mm leaving space for the finalBrand characteristics The BIONIKA DI UF implant system is compatible with the DIO UF platform and features an advanced conical connection (Conical Connection) combined with a hexagonal fit, ensuring micromovement free load transfer and exceptional stability. The 22 cone angle directs forces deep into the implant body, reducing cortical bone stress and promoting long term osseointegration. The spirally micro grooved, self locking, and self compressing