M06500 - SEMI M65 - 化合物半導体エピタキシャルウェーハに使用するサファイア基板の仕様 Revision:SEMI M65-0306E2 - Superseded 1-0918 (technical revision)

1-0918 (technical revision)

SEMI E88-0304 (technical revision)

the user estimates either the probability density function (PDF) or cumulative distribution function (CDF) of the process characteristic or characteristics of interest

The edge lengths specified range from 202

Secondary ion mass spectrometry (SIMS) can measure on polished silicon wafer product the following:

M06500 - SEMI M65 - 化合物半導体エピタキシャルウェーハに使用するサファイア基板の仕様 Revision:SEMI M65-0306E2 - Superseded 1-0918 (technical revision)global Compound Semiconductor Materials Committee2006116global Audits and Reviews Subcommittee20062www. semi. org20063CD ROM E20068R2 2 Referenced SEMI Standards SEMI M1 Specifications for Polished Monocrystalline Silicon Wafers SEMI M3 Specifications for Polished Monocrystalline Sapphire Substrates SEMI MF26 Test Method for Determining the Orientation of a Semi conductive Single Crystal SEMI MF523 Practice for Unaided Visual Inspections of Polished