50 ohm-cm - GEUa76D05C1R50US Crystal Substrate A-Z Front Surface finish (Ga-face): <1nm" loading="eager" fetchpriority="high" decoding="async"/>
Ge Wafer Undoped (100) 3" dia x 0.5 mm 1 side polished resistivity: >50 ohm-cm - GEUa76D05C1R50US Crystal Substrate A-Z Front Surface finish (Ga-face): <1nm
$212.72
Description
Front Surface finish (Ga-face): <1nm RMS
Specification Material Aluminum 99
Wafer Size: 5x5x0
SiC Ceramic Substrates
SiC foam is employed as a heating element which is a microwave susceptor
Ge Wafer Undoped (100) 3" dia x 0.5 mm 1 side polished resistivity: >50 ohm-cm - GEUa76D05C1R50US Crystal Substrate A-Z Front Surface finish (Ga-face): <1nmGe Wafer Specification Growing Method: CZ Orientation: (100) + 0. 5 Deg. Wafer Size: 3" dia x 0. 5 mm Surface Polishing: one side optical polished Surface finish (RMS or Ra) : < 30A Doping: Undoped Conductor type: N type Resistivity: >50 Ohms cm (If you would like to measure the resistivity accurately, please order our Portable 4 Probe Resistivity Testing Instrument.) Package: under 1000 class clean room in wafer container Related Product Other
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