Surface chemical analysis. Secondary ion mass spectrometry. Method for determining yield volume in argon cluster sputter depth profiling of organic materials Ingestion-build-177197 Manufacturers and retailers of secure

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Surface chemical analysis. Secondary ion mass spectrometry. Method for determining yield volume in argon cluster sputter depth profiling of organic materials Ingestion-build-177197 Manufacturers and retailers of secureWhat is this standard about? This document specifies a method for measuring and reporting argon cluster sputtering yield volumes of a specific organic material. The method requires one or more test samples of the specified material as a thin, uniform film of known thickness between 50 and 1 000 nanometres on a flat substrate which has a different chemical composition to the specified material. This document is applicable to test samples in which the