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SrTiO3 (111) 10x10x0.5 mm Epi polished wafer 2 SP - STOc101005S2 General Equipment Surface Density before rolling: 350g/m^2
SrTiO3 (111) 10x10x0.5 mm Epi polished wafer 2 SP - STOc101005S2 General Equipment Surface Density before rolling: 350g/m^2
$147.47
Description
Surface Density before rolling: 350g/m^2 Length: 300 mm
Voltage Rating : 125 V
Diameter: 50
excellent for CVD Application Item Description EQ-valve-on/off On-off valve with 1/4" BSPP male/female connector Flange Sealing flanges for tube Stainless Steel Sealing Flange Assembly for 1"-11" Processing Tubes
Digital control panel
SrTiO3 (111) 10x10x0.5 mm Epi polished wafer 2 SP - STOc101005S2 General Equipment Surface Density before rolling: 350g/m^2SrTiO3 single crystal provides a good lattice match to most materials with Perovskite structure. It is an excellent substrate for epitaxial growth of HTS and many oxide thin films. SrTiO3 single crystal has also been used widely for special optical windows and as high quality sputtering target. MTI has the full production line to manufacture first the high purity SrTiO3 powder, then the single crystal boules and finally the epi polished substrates in
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